As design rules shrink to 55 nm and below, IC manufacturers need automatic macro inspection systems that can detect critical defects while providing the throughput necessary for production lines. Yet, ...

Machine learning is becoming increasingly valuable in semiconductor manufacturing, where it is being used to improve yield and throughput. This is especially important in process control, where data ...

BEIJING, Aug. 31, 2023 /PRNewswire/ -- WiMi Hologram Cloud Inc. (NASDAQ: WIMI) ("WiMi" or the "Company"), a leading global Hologram Augmented Reality ("AR") Technology provider, today announced that ...

What is the Market Size of Wafer Defect Inspection System? BANGALORE, India, Dec. 16, 2025 /PRNewswire/ -- In 2024, the global market size of Wafer Defect Inspection System was estimated to be worth ...

Semiconductor wafer defect pattern recognition and classification is a crucial area of research that underpins yield enhancement and quality assurance in microelectronics manufacturing. The discipline ...

Photo-induced force microscopy (PiFM) offers nanoscale defect characterization in semiconductors, combining chemical specificity with high-resolution imaging.

Defect inspection scientists from Huazhong University of Science and Technology, Harbin Institute of Technology and The Chinese University of Hong Kong make a thorough review of new perspectives and ...

As design rules shrink to 45-nm and smaller, defect and yield engineers are becoming increasingly concerned about the quality of the defect frequency data coming from their review tools. To allow ...

As semiconductor manufacturers aim to produce devices at the 5-nanometer node, the ability to find tiny defects created inadvertently during the fabrication process becomes harder. In addition, there ...