Photronics Inc. today announced its Sub-Wavelength Reticle Solutions phase shift photomasks have been used to demonstrate the production of sub-100nm features using KrF (248nm) exposure technology.

AUSTIN, Texas — Motorola researchers said they are on track to develop the masks needed for extreme ultraviolet (EUV) lithography, which is expected to enter manufacturing at the 50-nanometer ...

Semiconductor Engineering sat down to discuss lithography and photomask issues with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

Experts at the Table: Semiconductor Engineering sat down to discuss extreme ultraviolet (EUV) lithography and other next-generation fab technologies with Jerry Chen, head of global business ...

Computer chips are undoubtedly one the great wonders of the modern world, incredible feats of engineering. And just when you thought they couldn't get any more complex and intriguing, here comes ...

In a milestone for the global semiconductor industry, Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better. Their new ...