SAN FRANCISCO — Brion Technologies Tuesday (Oct. 4) launched the beta version of a full-chip, full-process-window lithography simulation technology known as the Focus Exposure Modeling (FEM) system.

Cutting-edge lithography to create smaller features increasingly is being supplemented by improvements in lithography for mature process nodes, both of which are required as SoCs and complex chips are ...

One of the main challenges in developing semiconductor chip technology is making electronic components smaller and more effective. This difficulty is most noticeable in lithography, which is the ...

The ability to create materials with well-defined characteristics at the micro-and sub-micrometer dimensions is critical in a broad range of research fields and enterprises, from microelectronic chips ...

The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...