Design-Reuse

Mentor Graphics Introduces Catapult SL, the First High-Level Synthesis Tool to Create High-Performance Subsystems from Pure ANSI C++

WILSONVILLE, Ore., June 12, 2006 – Mentor Graphics Corporation (Nasdaq: MENT) today expanded the Catapult® product line with Catapult SL (System Level), the first high-level synthesis tool to ...
Business Wire

Mentor Graphics and AT&S Announce Embedded Component Package (ECP) Technology Partnership to Optimize PCB Design-Through-Manufacturing Flow

WILSONVILLE, Ore.--(BUSINESS WIRE)--Mentor Graphics Corporation (NASDAQ: MENT), the market and technology leader in printed circuit board (PCB) design solutions, today announced the technology ...
EDN

Mentor Unveils FPGA Design-Flow Plans

Design creation and verification tools such as the Mentor Graphics Platform Express Design Environment can guide users through complex embedded-system development, facilitating the attachment of ...
Design-Reuse

Mentor Graphics Configurable Port is Compliant with the PCI Express Specification

WILSONVILLE, Ore.--(BUSINESS WIRE) -- April 13, 2005 -- Mentor Graphics Corporation (Nasdaq:MENT), a leader in standards-based semiconductor intellectual property (IP), today announced that its ...
Electronic Design

Agilent Debuts Mentor-Powered FPGA Development Kit for Digitizers

June 28, 2013. Agilent Technologies Inc. has introduced the U5340A FPGA development kit, powered by a custom Mentor Graphics design engine, for high-speed digitizers. The U5340A enables customers to ...
Business Wire

Mentor Graphics Questa Verification Platform Enables Broad Adoption of Formal Verification

WILSONVILLE, Ore.--(BUSINESS WIRE)--Mentor Graphics Corp. (NASDAQ:MENT) today announced new formal-based technologies in the Questa ® Verification Platform that provide mainstream users with the ...
EDN

Sagantec Announces a New DFM Solution Integrated with Mentor Graphics’ Calibre LFD

Monday, June 4, 2007 Sagantec Announces a New DFM Solution Integrated with Mentor Graphics’ Calibre LFDThe combined flow detects and corrects lithography-induced hot spots in 65nm and below process ...