These applications put forward stringent fabrication requirements, including dimensional accuracy, shape accuracy, and surface roughness. Two-photon lithography is a versatile technique capable of ...

As anticipated, this year’s Advanced Lithography + Patterning Symposium was a very informative event, with many interesting papers being presented across a wide range of subjects. Many papers ...

Concern is rising about the ability of today’s microlithography equipment to scale below 45-nm design rules and still print with acceptable fidelity. There are different schools of thought on how best ...

Some chip makers have been getting a boost from implementing optical proximity correction across the lithography process window at the 65- and even 90-nanometer nodes, but the practice will become ...

As process technology shrinks beyond the 45-nm node, EDA industry observers tend to worry—and perhaps with justification—about the readiness of backend tools for those new generations of fabrication ...