Installation of plasma deposition tool at chip research manufacturing line is part of $10 million in upgrades to R&D chipmaking equipment Bryant Colwill, manager of the University at Albany’s College ...
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The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...
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The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...
How atomic-layer deposition and hybrid dielectrics are redefining reliability and scaling for AI-era semiconductors.
(Nanowerk News) A team of researchers, led by Professor Soo-Hyun Kim in the Graduate School of Semiconductors Materials and Devices Engineering and the Department of Materials Science and Engineering ...
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Researchers unveil innovative deposition technology for uniform metal alloys at the atomic scale
A research team at UNIST has developed a new deposition technology that enables the uniform mixing of different metals within a single atomic layer. This advancement holds significant promise for ...
A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...
Researchers at UNIST’s Graduate School of Semiconductors Materials and Devices Engineering and Department of Materials Science and Engineering, under the direction of Professor Soo-Hyun Kim, have made ...
Researchers in Spain have developed an n-type crystalline silicon solar cell based on vanadium oxide films deposited by atomic layer deposition. The cell showed an open-circuit voltage of 631 mV, a ...
ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...
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