AZoNano

Atomic Layer Deposition vs Chemical Vapor Deposition

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...
Nature

Atomic Layer Deposition and Area-Selective Deposition Techniques

The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...
AZoNano

What is Atomic Layer Deposition?

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...
Science Daily

Atomic layer deposition route to scalable, electronic-grade van der Waals Te thin films

A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...
pv magazine International

Kalpana Systems launches roll-to-roll spatial atomic layer deposition tools

Kalpana Systems, a Dutch equipment manufacturer, is launching spatial atomic layer deposition (sALD) tools to be used in roll-to-roll manufacturing processes in the solar PV, organic light emitting ...
Semiconductor Engineering

Enabling Advanced Devices With Atomic Layer Processes

Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...